Development OFTiO2-SiO2 thin film catalyst for air purification /
Photocatalyst has been established as one of the promising technique for environmental purification technology especially used for air pollutants removal. The development and innovation of semiconductor materials which has an ability to degrade the organic contaminants in air are highly desirable. I...
Saved in:
| Main Author: | |
|---|---|
| Format: | Thesis |
| Language: | English |
| Published: |
Gombak, Selangor :
Kulliyyah of Engineering, International Islamic University Malaysia,
2010
|
| Subjects: | |
| Online Access: | Click here to view 1st 24 pages of the thesis. Members can view fulltext at the specified PCs in the library. |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | Photocatalyst has been established as one of the promising technique for environmental purification technology especially used for air pollutants removal. The development and innovation of semiconductor materials which has an ability to degrade the organic contaminants in air are highly desirable. In this dissertation, a promising photocatalyst of TiO2-SiO2 thin film was synthesized via a simple sol-gel method accompanied by the spin coating process. The study on the effect of insertion a second semiconductor material on the physical and chemical properties of the TiO2 thin film photocatalyst is necessary in order to find a better way for enhancing the photocatalytic activity of the thin film photocatalyst. From XRD analysis, it was found that the thin film obtained was fully anatase crystal structure after calcined at 500 °C for 7 hours. The suppressive effect on the TiO2 crystal growth was observed for lower content of SiO2. Besides, the effect of using different metal alkoxide to synthesize the precursor solution is beneficial to find the desired characteristic of thin film photocatalyst. It was observed that TiO2 particles of PTP derived thin film and powder was smaller than that of TPT derived thin film and powder due to different hydrolysis rate of the metal alkoxide. FESEM picture showed that nanosized and spherical particle was obtained. With the aim of finding the main factor of the photocatalytic activity of the TiO2-SiO2 thin film photocatalyst, a kinetic study using a Langmuir- Hinshelwood kinetic model is employed. Photocatalytic activity of the TF95/5 and TF90/10 thin film photocatalyst was evaluated on degrading acetaldehyde gas. TF90/10 thin film photocatalyst showed better adsorption property due to its high surface area. However, TF95/5 thin film photocatalyst showed higher degradation rate of decomposing the acetaldehyde gas molecules due to high crystallinity of the thin film photocatalyst leading to better charge separation and produce more charge carriers. |
|---|---|
| Item Description: | "A thesis submitted in fulfilment of the requirement for the degree of Master of Science (Materials Engineering)"--On t.p. |
| Physical Description: | xvi, 174 leaves : ill. ; 30 cm. |
| Bibliography: | Includes bibliographical references (leaves 160-172) |