Parametric study of sputtering microchannels on silicon using a focused ion beam /
Focused ion beam (FIB) has been widely used in microelectronic applications as it has the capabilities to perform both imaging and sputtering down to the nanometer scale. Essential FIB parameters include the accelerating voltage, beam current, beam diameter, pixel spacing, dwell time and scanning ti...
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| 格式: | Thesis |
| 语言: | English |
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Kuala Lumpur :
Kulliyyah of Engineering, International Islamic University Malaysia,
2017
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| 在线阅读: | Click here to view 1st 24 pages of the thesis. Members can view fulltext at the specified PCs in the library. |
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