Modelling of overlay virtual metrology system in photolithography process
Prior works on overlay VM system applied wafer-level modelling approach by utilizing fault detection and classification (FDC) data from the photolithography equipment as the source data to construct process representatives for each wafer. However, owing to active research for continuous improvement,...
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Main Author: | Tin, Tze Chiang |
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Format: | Thesis |
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2022
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