A study of nanostructured Indium Tin Oxide by pulsed laser deposition
This study is concerned with the deposition of ITO nanostructure via 355 nm pulsed Nd:YAG laser ablation of ITO target on glass substrate in gaseous environment of argon and nitrogen gas respectively. Since ITO thin films are expected to crystallize above 150 °C, substrate heating is utilized. In ad...
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2011
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| Summary: | This study is concerned with the deposition of ITO nanostructure via 355 nm pulsed Nd:YAG laser ablation of ITO target on glass substrate in gaseous environment of argon and nitrogen gas respectively. Since ITO thin films are expected to crystallize above 150 °C, substrate heating is utilized. In addition, higher temperature growth also yields a lower resistivity with improved crystallinity simultaneously. The process parameters such as laser fluence, gas pressure, and target to substrate distance, deposition time and temperature play an important role in influencing the film‘s surface morphology and properties. Characterization techniques such as X-Ray Diffraction (XRD), Field Emission Secondary Electron Microscope (FESEM), Four-Point Probe, Atomic Force Microscope (AFM) and others are used to assess the properties of nanostructured ITO films. |
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