A study of nanostructured Indium Tin Oxide by pulsed laser deposition
This study is concerned with the deposition of ITO nanostructure via 355 nm pulsed Nd:YAG laser ablation of ITO target on glass substrate in gaseous environment of argon and nitrogen gas respectively. Since ITO thin films are expected to crystallize above 150 °C, substrate heating is utilized. In ad...
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2011
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