NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin

Negative Bias Temperature Instability (NBTI) is an aging mechanism that has become a key reliability issue in MOSFETs technology as well as FinFETs technology. The main reliability issues regarding the NBTI mechanism are that NBTI not only degrades the transistor electrical properties but also degra...

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Main Author: Zainudin, Muhammad Fitri
Format: Thesis
Language:English
Published: 2020
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Online Access:https://ir.uitm.edu.my/id/eprint/59571/1/59571.pdf
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spelling my-uitm-ir.595712022-05-13T06:23:04Z NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin 2020-03 Zainudin, Muhammad Fitri Electric apparatus and materials. Electric circuits. Electric networks Negative Bias Temperature Instability (NBTI) is an aging mechanism that has become a key reliability issue in MOSFETs technology as well as FinFETs technology. The main reliability issues regarding the NBTI mechanism are that NBTI not only degrades the transistor electrical properties but also degrades the device performance as well as shortens the device operation lifetime over time. Therefore, the main objective of this study is to investigate the effect of the NBTI mechanism on the performance of the flip-flop circuits based on Single-Edge Triggered Flip-Flop (SETFF) and Double-Edge Triggered Flip-Flop (DETFF). In this work, the flip-flop circuits are simulated with different stress conditions and process variations by using HSPICE with MOSFET Reliability Analysis (MOSRA) and Predictive Technology Model (PTM) from 32nm to 16nm. The results suggested that the flip-flop circuits based on FinFET technology and MOSRA-based interface trap model (at VDD=0.85V and T=125°C) can increase the delay time by 0.026% to 4.27% while the power consumption decreases by 21.67% to 26.34%. Under the same stress conditions, the findings have shown that the performance of DETFFs has higher degradation compare to SETFFs which results in 4.27% increase in delay time and 26.34% reduction in power consumption. 2020-03 Thesis https://ir.uitm.edu.my/id/eprint/59571/ https://ir.uitm.edu.my/id/eprint/59571/1/59571.pdf text en public masters Universiti Teknologi MARA Faculty of Electrical Engineering Hussin, Hanim (Dr.) Karim, Jamilah (Dr.) Halim, Abdul Karimi
institution Universiti Teknologi MARA
collection UiTM Institutional Repository
language English
advisor Hussin, Hanim (Dr.)
Karim, Jamilah (Dr.)
Halim, Abdul Karimi
topic Electric apparatus and materials
Electric circuits
Electric networks
spellingShingle Electric apparatus and materials
Electric circuits
Electric networks
Zainudin, Muhammad Fitri
NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
description Negative Bias Temperature Instability (NBTI) is an aging mechanism that has become a key reliability issue in MOSFETs technology as well as FinFETs technology. The main reliability issues regarding the NBTI mechanism are that NBTI not only degrades the transistor electrical properties but also degrades the device performance as well as shortens the device operation lifetime over time. Therefore, the main objective of this study is to investigate the effect of the NBTI mechanism on the performance of the flip-flop circuits based on Single-Edge Triggered Flip-Flop (SETFF) and Double-Edge Triggered Flip-Flop (DETFF). In this work, the flip-flop circuits are simulated with different stress conditions and process variations by using HSPICE with MOSFET Reliability Analysis (MOSRA) and Predictive Technology Model (PTM) from 32nm to 16nm. The results suggested that the flip-flop circuits based on FinFET technology and MOSRA-based interface trap model (at VDD=0.85V and T=125°C) can increase the delay time by 0.026% to 4.27% while the power consumption decreases by 21.67% to 26.34%. Under the same stress conditions, the findings have shown that the performance of DETFFs has higher degradation compare to SETFFs which results in 4.27% increase in delay time and 26.34% reduction in power consumption.
format Thesis
qualification_level Master's degree
author Zainudin, Muhammad Fitri
author_facet Zainudin, Muhammad Fitri
author_sort Zainudin, Muhammad Fitri
title NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
title_short NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
title_full NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
title_fullStr NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
title_full_unstemmed NBTI effects on the performance of SET and DET D flip-flop topologies by using MOSRA and predictive technology models / Muhammad Fitri Zainudin
title_sort nbti effects on the performance of set and det d flip-flop topologies by using mosra and predictive technology models / muhammad fitri zainudin
granting_institution Universiti Teknologi MARA
granting_department Faculty of Electrical Engineering
publishDate 2020
url https://ir.uitm.edu.my/id/eprint/59571/1/59571.pdf
_version_ 1783735039529320448