Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application

Biochip is a promising device with capabilities of performing sorting, trapping and screening a large number of biological samples in a short time. Fabrication of biochip pattern process leads to an opening study towards the development of a working biochip. The traditional photolithography process...

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Main Author:	Beh, Khi Khim
Format:	Thesis
Language:	English
Published:	2016
Subjects:	TK Electrical engineering Electronics Nuclear engineering
Online Access:	http://umpir.ump.edu.my/id/eprint/18147/19/Process%20development%20of%20the%20device%20using%20in-house%20plate-to-plate%20tool%20with%20nanoimprint%20lithography%20technique%20for%20biochip%20application.pdf
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id	my-ump-ir.18147
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spelling	my-ump-ir.181472021-12-15T00:04:05Z Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application 2016-12 Beh, Khi Khim TK Electrical engineering. Electronics Nuclear engineering Biochip is a promising device with capabilities of performing sorting, trapping and screening a large number of biological samples in a short time. Fabrication of biochip pattern process leads to an opening study towards the development of a working biochip. The traditional photolithography process have a limitation in achieving high throughput for biochip pattern fabrication. In this research, the fabrication process of biochip pattern was developed and the imprint parameter for biochip pattern using an in-house assembled plate-to-plate tool was investigated. The biochip patterns are prepared from existing projection lithography to create the mold. Using soft lithography technique, the biochip pattern was replicated invertly in the PDMS mold. The PDMS mold and in-house plate-to-plate fulfilled the requirement for UV-NIL to imprint biochip patterns on a flexible substrate. Dimension error difference (DED) is the difference between the original design dimensions to fabricated design dimensions. DED was characterized and investigated for precise pattern transfer. UV exposure of 140 W was able to produce the satisfied imprint pattern in biochip pattern mold fabrication. However, higher UV energy caused overexposure in the resist, resulting wider width and bridging. Besides that, crack regions were found when post bake exposure parameters are not properly optimized. The DED between biochip pattern mold and PDMS mold are less compared to biochip pattern mold fabrication in the photolithography process. Critical dimension in the biochip pattern was maintained in the imprint process. However, the higher imprint force will cause an overflow of the resist on the substrate, resulting unsatisfied pattern structure. The proposed parameters for imprinting biochip patterns using in-house plate-to-plate tool are 80 N range and 20 seconds of UV exposure. 2016-12 Thesis http://umpir.ump.edu.my/id/eprint/18147/ http://umpir.ump.edu.my/id/eprint/18147/19/Process%20development%20of%20the%20device%20using%20in-house%20plate-to-plate%20tool%20with%20nanoimprint%20lithography%20technique%20for%20biochip%20application.pdf pdf en public masters Universiti Malaysia Pahang Faculty of Electrical and Electronics Engineering
institution	Universiti Malaysia Pahang Al-Sultan Abdullah
collection	UMPSA Institutional Repository
language	English
topic	TK Electrical engineering Electronics Nuclear engineering
spellingShingle	TK Electrical engineering Electronics Nuclear engineering Beh, Khi Khim Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
description	Biochip is a promising device with capabilities of performing sorting, trapping and screening a large number of biological samples in a short time. Fabrication of biochip pattern process leads to an opening study towards the development of a working biochip. The traditional photolithography process have a limitation in achieving high throughput for biochip pattern fabrication. In this research, the fabrication process of biochip pattern was developed and the imprint parameter for biochip pattern using an in-house assembled plate-to-plate tool was investigated. The biochip patterns are prepared from existing projection lithography to create the mold. Using soft lithography technique, the biochip pattern was replicated invertly in the PDMS mold. The PDMS mold and in-house plate-to-plate fulfilled the requirement for UV-NIL to imprint biochip patterns on a flexible substrate. Dimension error difference (DED) is the difference between the original design dimensions to fabricated design dimensions. DED was characterized and investigated for precise pattern transfer. UV exposure of 140 W was able to produce the satisfied imprint pattern in biochip pattern mold fabrication. However, higher UV energy caused overexposure in the resist, resulting wider width and bridging. Besides that, crack regions were found when post bake exposure parameters are not properly optimized. The DED between biochip pattern mold and PDMS mold are less compared to biochip pattern mold fabrication in the photolithography process. Critical dimension in the biochip pattern was maintained in the imprint process. However, the higher imprint force will cause an overflow of the resist on the substrate, resulting unsatisfied pattern structure. The proposed parameters for imprinting biochip patterns using in-house plate-to-plate tool are 80 N range and 20 seconds of UV exposure.
format	Thesis
qualification_level	Master's degree
author	Beh, Khi Khim
author_facet	Beh, Khi Khim
author_sort	Beh, Khi Khim
title	Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
title_short	Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
title_full	Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
title_fullStr	Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
title_full_unstemmed	Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
title_sort	process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application
granting_institution	Universiti Malaysia Pahang
granting_department	Faculty of Electrical and Electronics Engineering
publishDate	2016
url	http://umpir.ump.edu.my/id/eprint/18147/19/Process%20development%20of%20the%20device%20using%20in-house%20plate-to-plate%20tool%20with%20nanoimprint%20lithography%20technique%20for%20biochip%20application.pdf
_version_	1783732027254636544

Process development of the device using in-house plate-to-plate tool with nanoimprint lithography technique for biochip application

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