Design, fabrication and characterization of CMOS ISFET for pH measurements
The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH sensor that is easily adapted to a wide range of chemical, biochemical and biomedical applications. The operation of an ISFET is based on the surface adsorption of charges from the test solution in the solid-electrolyte inte...
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my-unimap-129192011-07-01T07:14:53Z Design, fabrication and characterization of CMOS ISFET for pH measurements Chin, Seng Fatt The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH sensor that is easily adapted to a wide range of chemical, biochemical and biomedical applications. The operation of an ISFET is based on the surface adsorption of charges from the test solution in the solid-electrolyte interface that is part of the gate of the ISFET. As a result of this process, the threshold voltage of the ISFET is modulated.This thesis describes the design, simulation, fabrication and characterization of ISFET for pH measurement of an aqueous solution. Prior to fabrication, the ISFET is simulated via TCAD TSUPREM4 process and MEDICI device simulator. The ISFET is fabricated in-house in the Micro Fabrication Cleanroom Laboratory (MFCL) at Universiti of Malaysia Perlis (UniMAP) by using CMOS fabrication technology. This goal is achieved due to the compatibility of ISFET and CMOS. Silicon nitride was used as an ion sensitive membrane and it was deposited by using Plasma Enhanced Chemical Vapour Deposition (PECVD) technique. A total of six masks were used in this fabrication to create the CMOS ISFET. The ISFET fabricated is aimed at pH measurement of aqueous solution. In order to obtain an accurate characterization of the ISFET, a semiconductor characterization system (SCS) comprises of a micro probe station and a parameter analyzer was utilized. For the analysis of ISFET in test solution, an Ag/AgCl electrode is used as a reference electrode and three types of standard aqueous pH buffer solutions of pH 4, pH 7 and pH 10 were used during the experiment of ISFET analysis. The sensitivity of the ISFETs measured is 40mV/pH for n-channel ISFET and 30mV/pH for p-channel ISFET. These results demonstrate that the in-house fabricated CMOS ISFET is functional as expected. Universiti Malaysia Perlis 2009 Thesis en http://dspace.unimap.edu.my/123456789/12919 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/12919/1/p.%201-24.pdf 1d4271a965b90dc848bde0372c7310a1 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/12919/2/Full%20Text.pdf a0763c0eab20c4d93c7471c03259e895 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/12919/3/license.txt e40f6d077a27bcb3df76e42862359a22 Ion Sensitive Field Effect Transistor (ISFET) Potential Hydrogen (pH) pH sensitivity CMOS ISFET Simulation CMOS technology CMOS School of Microelectronic Engineering |
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Universiti Malaysia Perlis |
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UniMAP Institutional Repository |
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English |
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Ion Sensitive Field Effect Transistor (ISFET) Potential Hydrogen (pH) pH sensitivity CMOS ISFET Simulation CMOS technology CMOS |
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Ion Sensitive Field Effect Transistor (ISFET) Potential Hydrogen (pH) pH sensitivity CMOS ISFET Simulation CMOS technology CMOS Chin, Seng Fatt Design, fabrication and characterization of CMOS ISFET for pH measurements |
description |
The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH
sensor that is easily adapted to a wide range of chemical, biochemical and
biomedical applications. The operation of an ISFET is based on the surface
adsorption of charges from the test solution in the solid-electrolyte interface that
is part of the gate of the ISFET. As a result of this process, the threshold
voltage of the ISFET is modulated.This thesis describes the design, simulation,
fabrication and characterization of ISFET for pH measurement of an aqueous
solution. Prior to fabrication, the ISFET is simulated via TCAD TSUPREM4
process and MEDICI device simulator. The ISFET is fabricated in-house in the
Micro Fabrication Cleanroom Laboratory (MFCL) at Universiti of Malaysia Perlis
(UniMAP) by using CMOS fabrication technology. This goal is achieved due to
the compatibility of ISFET and CMOS. Silicon nitride was used as an ion
sensitive membrane and it was deposited by using Plasma Enhanced Chemical
Vapour Deposition (PECVD) technique. A total of six masks were used in this
fabrication to create the CMOS ISFET. The ISFET fabricated is aimed at pH
measurement of aqueous solution. In order to obtain an accurate
characterization of the ISFET, a semiconductor characterization system (SCS)
comprises of a micro probe station and a parameter analyzer was utilized. For
the analysis of ISFET in test solution, an Ag/AgCl electrode is used as a
reference electrode and three types of standard aqueous pH buffer solutions of
pH 4, pH 7 and pH 10 were used during the experiment of ISFET analysis. The
sensitivity of the ISFETs measured is 40mV/pH for n-channel ISFET and
30mV/pH for p-channel ISFET. These results demonstrate that the in-house
fabricated CMOS ISFET is functional as expected. |
format |
Thesis |
author |
Chin, Seng Fatt |
author_facet |
Chin, Seng Fatt |
author_sort |
Chin, Seng Fatt |
title |
Design, fabrication and characterization of CMOS ISFET for pH measurements |
title_short |
Design, fabrication and characterization of CMOS ISFET for pH measurements |
title_full |
Design, fabrication and characterization of CMOS ISFET for pH measurements |
title_fullStr |
Design, fabrication and characterization of CMOS ISFET for pH measurements |
title_full_unstemmed |
Design, fabrication and characterization of CMOS ISFET for pH measurements |
title_sort |
design, fabrication and characterization of cmos isfet for ph measurements |
granting_institution |
Universiti Malaysia Perlis |
granting_department |
School of Microelectronic Engineering |
url |
http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/12919/1/p.%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/12919/2/Full%20Text.pdf |
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