Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium

Surface metrology has been a focused and thoroughly investigated research niche since the advent of device fabrication. The current technology shift into MEMS and nano has again made surface metrology a focused area. Layer adhesion and bonding have surface metrology importance here. In this work, su...

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Main Author:	Moganraj, Palianysamy
Format:	Thesis
Language:	English
Subjects:	Microelectronic engineering Surface roughness Surface metrology Aluminium deposition Surface Wettability Physical Vapor Deposition (PVD)
Online Access:	http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/1/Page%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/2/Full%20text.pdf
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id	my-unimap-31159
record_format	uketd_dc
spelling	my-unimap-311592014-01-12T13:20:32Z Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium Moganraj, Palianysamy Surface metrology has been a focused and thoroughly investigated research niche since the advent of device fabrication. The current technology shift into MEMS and nano has again made surface metrology a focused area. Layer adhesion and bonding have surface metrology importance here. In this work, surface of aluminium bond pad is characterized using water droplet test and Atomic Force Microscopy(AFM) analysis. Full Factorial Experiment Design was used to carry out this experimental study. Aluminium was deposited using Physical Vapor Deposition(PVD) technique. Water droplet test was done using a prepared test chamber. The surface was treated using plasma parameter, whereby the plasma parameter and roughness were correlated. Plasma parameter was manipulated in two different experiment approaches. First experiment was using a combination of oxygen gas flow, argon gas flow, ICP power and Bias power. Second experiment consist of Carbon Tetrafluoride(CF4) gas flow, Argon gas flow, ICP power and BIAS power. Results of surface characterization were analyzed using statistical analysis comprising main effect analysis and interaction between factor analyses. This provides the effect of each factor and combination of factors which affects the outcome of the experiment. This correlation of plasma parameter to surface roughness and water droplet test will enable us to understand aluminium surface manipulation for bonding and other adhesion purposes. Final results shows that the experiment comprising of Carbon Tetrafluoride(CF4)gas flow, Argon gas flow, ICP power and BIAS power produces surface with a higher hydrophilicity characteristics proven by the measured contact angle which averages at 56°. The surface roughness value range from 2.46nm to 19.53nm Whereas, experiment comprising oxygen gas flow, argon gas flow, ICP power and BIAS power produces lower hydrophilic character surfaces which has a higher average contact angle which is 70°.This contact angles are produced by surface roughness ranging from 4.09nm to 20.09nm. Universiti Malaysia Perlis (UniMAP) 2013 Thesis en http://dspace.unimap.edu.my:80/dspace/handle/123456789/31159 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/1/Page%201-24.pdf c91a70181157cdb964c6f04a89f0056f http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/2/Full%20text.pdf 0b8a21c635bc185a5d832ea4e83308a1 http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/3/license.txt 8a4605be74aa9ea9d79846c1fba20a33 Microelectronic engineering Surface roughness Surface metrology Aluminium deposition Surface Wettability Physical Vapor Deposition (PVD) School of Microelectronic Engineering
institution	Universiti Malaysia Perlis
collection	UniMAP Institutional Repository
language	English
topic	Microelectronic engineering Surface roughness Surface metrology Aluminium deposition Surface Wettability Physical Vapor Deposition (PVD)
spellingShingle	Microelectronic engineering Surface roughness Surface metrology Aluminium deposition Surface Wettability Physical Vapor Deposition (PVD) Moganraj, Palianysamy Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
description	Surface metrology has been a focused and thoroughly investigated research niche since the advent of device fabrication. The current technology shift into MEMS and nano has again made surface metrology a focused area. Layer adhesion and bonding have surface metrology importance here. In this work, surface of aluminium bond pad is characterized using water droplet test and Atomic Force Microscopy(AFM) analysis. Full Factorial Experiment Design was used to carry out this experimental study. Aluminium was deposited using Physical Vapor Deposition(PVD) technique. Water droplet test was done using a prepared test chamber. The surface was treated using plasma parameter, whereby the plasma parameter and roughness were correlated. Plasma parameter was manipulated in two different experiment approaches. First experiment was using a combination of oxygen gas flow, argon gas flow, ICP power and Bias power. Second experiment consist of Carbon Tetrafluoride(CF4) gas flow, Argon gas flow, ICP power and BIAS power. Results of surface characterization were analyzed using statistical analysis comprising main effect analysis and interaction between factor analyses. This provides the effect of each factor and combination of factors which affects the outcome of the experiment. This correlation of plasma parameter to surface roughness and water droplet test will enable us to understand aluminium surface manipulation for bonding and other adhesion purposes. Final results shows that the experiment comprising of Carbon Tetrafluoride(CF4)gas flow, Argon gas flow, ICP power and BIAS power produces surface with a higher hydrophilicity characteristics proven by the measured contact angle which averages at 56°. The surface roughness value range from 2.46nm to 19.53nm Whereas, experiment comprising oxygen gas flow, argon gas flow, ICP power and BIAS power produces lower hydrophilic character surfaces which has a higher average contact angle which is 70°.This contact angles are produced by surface roughness ranging from 4.09nm to 20.09nm.
format	Thesis
author	Moganraj, Palianysamy
author_facet	Moganraj, Palianysamy
author_sort	Moganraj, Palianysamy
title	Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
title_short	Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
title_full	Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
title_fullStr	Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
title_full_unstemmed	Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium
title_sort	surface roughness and wettability investigation of varied plasma parameter effect on pvd deposited aluminium
granting_institution	Universiti Malaysia Perlis (UniMAP)
granting_department	School of Microelectronic Engineering
url	http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/1/Page%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/31159/2/Full%20text.pdf
_version_	1747836783749496832

Surface roughness and wettability investigation of varied plasma parameter effect on PVD deposited aluminium

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