Preparation and characterization of bulk nanoporous Sn, SnO2 AND Zn
Extreme ultraviolet lithography (EUVL) has garnered much attention due to its potential in high-volume manufacturing (HVM) of integrated circuit (IC). This research contributes to the study of EUV source target. It has been stated that in the world of semiconductor future roadmaps, there is a need...
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| 格式: | Thesis |
| 语言: | English |
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| 在线阅读: | http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/44125/1/p.1-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/44125/2/full%20text.pdf |
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