Fabrication and characterization of ultra thin Si0₂ for nano devices: surface morphology and electrical study

Fabrication and characterization of ultra thin Si0₂ for nano devices: surface morphology and electrical study

The aim of this research is to fabricate and characterize (optical and electrical) an ultra thin silicon dioxide for sub nano devices. In this research, dry oxidation method using high temperature furnace is chosen to fabricate a thin layer of oxide below 30Angstroms. There are three level of tempe...

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書目詳細資料
主要作者:	Mohd Faiz Aizad, Abdul Fatah
格式:	Thesis
語言:	English
主題:	Silicon nitride Electric insulators and insulation > Thin films Thin films Sub nano devices Ultra thin silicon dioxide
在線閱讀:	http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/63455/1/Page%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/63455/2/Full%20text.pdf
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