Characterization of alignment mark to obtain reliable alignment performance in advanced lithography

Characterization of alignment mark to obtain reliable alignment performance in advanced lithography

The continued downscaling of semiconductor fabrication has imposed increasingly tighter overlay tolerances. Such tight tolerances will require very high performance in alignment. Hence, the objective of this research to establish characterization process for alignment evaluation and to determine th...

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书目详细资料
主要作者:	Normah, Ahmad
格式:	Thesis
语言:	English
主题:	Semiconductor Microlitoghraphy Alignment ASML Scanner Alignment System Alignment process
在线阅读:	http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/63456/1/Page%201-24.pdf http://dspace.unimap.edu.my:80/xmlui/bitstream/123456789/63456/2/Full%20text.pdf
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