Chai, J. H. S. (2009). Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield.
Chicago Style (17th ed.) CitationChai, Jane Hai Sing. Interaction Effect of Rca Dilution, Temperature and Megasonic on Particle Removal Efficiency, Gate Oxide Quality, Defect Density and Yield. 2009.
MLA引文Chai, Jane Hai Sing. Interaction Effect of Rca Dilution, Temperature and Megasonic on Particle Removal Efficiency, Gate Oxide Quality, Defect Density and Yield. 2009.
警告:这些引文格式不一定是100%准确.