Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield
Tweaking RCA (Radio Corporation of America) cleaning process has been the choice of many manufacturers in order to meet the stringent requirement of ITRS (International Technology Roadmap for Semiconductor) as the involvement cost and cycle time is low. It is necessary to understand the interaction...
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| 格式: | Thesis |
| 语言: | English |
| 出版: |
2009
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| 主题: | |
| 在线阅读: | http://ir.unimas.my/id/eprint/3152/1/Jane%20Chai%20Hai%20Sing%20ft.pdf |
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