Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is...
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| Format: | Thesis |
| Language: | English English |
| Published: |
2003
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| Subjects: | |
| Online Access: | http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf |
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| Summary: | Boron Steam is a process done after boron emitter diffusion for all PNP
transistors and diodes. Boron emitter diffusion is a process to dope the emitter
well with P-type dopant. The source of this dopant is in the form of liquid spun on
the wafers and exposed to high temperatures. Boron steam is done to basically
soften the residual liquid boron prior to cleaning for easy removal. This project
will cover hardware comparison and recipe proposal that were used. The new
consolidated process has resulted in comparable final in-line measurement of
oxide thickness and test results. Reliability expectation was also met with 1000
cycles of Intermittent Operating Life test. Significant cost advantages were also
achieved. |
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