Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication

Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is...

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Main Author: Abd.Wahab, Kader Ibrahim
Format: Thesis
Language:English
English
Published: 2003
Subjects:
Online Access:http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf
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spelling my-upm-ir.121632011-07-15T03:23:35Z Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication 2003-03 Abd.Wahab, Kader Ibrahim Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved. Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation 2003-03 Thesis http://psasir.upm.edu.my/id/eprint/12163/ http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf application/pdf en public masters Universiti Putra Malaysia Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation Faculty of Engineering English
institution Universiti Putra Malaysia
collection PSAS Institutional Repository
language English
English
topic Boron - Isotopes - Spectra
Diffusion
Transistor - Effect of radiation
spellingShingle Boron - Isotopes - Spectra
Diffusion
Transistor - Effect of radiation
Abd.Wahab, Kader Ibrahim
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
description Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved.
format Thesis
qualification_level Master's degree
author Abd.Wahab, Kader Ibrahim
author_facet Abd.Wahab, Kader Ibrahim
author_sort Abd.Wahab, Kader Ibrahim
title Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_short Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_full Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_fullStr Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_full_unstemmed Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_sort process consolidation of boron steam and emitter diffusion in pnp bipolar transistor fabrication
granting_institution Universiti Putra Malaysia
granting_department Faculty of Engineering
publishDate 2003
url http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf
_version_ 1747811318658760704