Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is...
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my-upm-ir.121632011-07-15T03:23:35Z Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication 2003-03 Abd.Wahab, Kader Ibrahim Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved. Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation 2003-03 Thesis http://psasir.upm.edu.my/id/eprint/12163/ http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf application/pdf en public masters Universiti Putra Malaysia Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation Faculty of Engineering English |
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Universiti Putra Malaysia |
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English English |
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Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation |
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Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation Abd.Wahab, Kader Ibrahim Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication |
description |
Boron Steam is a process done after boron emitter diffusion for all PNP
transistors and diodes. Boron emitter diffusion is a process to dope the emitter
well with P-type dopant. The source of this dopant is in the form of liquid spun on
the wafers and exposed to high temperatures. Boron steam is done to basically
soften the residual liquid boron prior to cleaning for easy removal. This project
will cover hardware comparison and recipe proposal that were used. The new
consolidated process has resulted in comparable final in-line measurement of
oxide thickness and test results. Reliability expectation was also met with 1000
cycles of Intermittent Operating Life test. Significant cost advantages were also
achieved. |
format |
Thesis |
qualification_level |
Master's degree |
author |
Abd.Wahab, Kader Ibrahim |
author_facet |
Abd.Wahab, Kader Ibrahim |
author_sort |
Abd.Wahab, Kader Ibrahim |
title |
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
|
title_short |
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
|
title_full |
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
|
title_fullStr |
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
|
title_full_unstemmed |
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
|
title_sort |
process consolidation of boron steam and emitter diffusion in pnp bipolar transistor fabrication |
granting_institution |
Universiti Putra Malaysia |
granting_department |
Faculty of Engineering |
publishDate |
2003 |
url |
http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22_A.pdf |
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1747811318658760704 |