Teo, S. L. (2011). Electrochemical Deposition and Characterization of Copper Indium Disulfide Semiconductor Thin Films.
Chicago Style (17th ed.) CitationTeo, Sook Liang. Electrochemical Deposition and Characterization of Copper Indium Disulfide Semiconductor Thin Films. 2011.
MLA引文Teo, Sook Liang. Electrochemical Deposition and Characterization of Copper Indium Disulfide Semiconductor Thin Films. 2011.
警告:这些引文格式不一定是100%准确.