The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology

The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology

Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of...

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Main Author: Lee, Kang Hai
Format: Thesis
Language:English
Published: 2006
Subjects:
R5-920 Medicine (General)
Online Access:http://eprints.usm.my/29274/1/The_effect_of_implant_angle.pdf
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spelling my-usm-ep.292742017-05-15T04:43:34Z The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology 2006-07 Lee, Kang Hai R5-920 Medicine (General) Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm. 2006-07 Thesis http://eprints.usm.my/29274/ http://eprints.usm.my/29274/1/The_effect_of_implant_angle.pdf application/pdf en public masters USM Pusat Pengajian Sains Perubatan
institution Universiti Sains Malaysia
collection USM Institutional Repository
language English
topic R5-920 Medicine (General)
spellingShingle R5-920 Medicine (General)
Lee, Kang Hai
The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
description Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.
format Thesis
qualification_level Master's degree
author Lee, Kang Hai
author_facet Lee, Kang Hai
author_sort Lee, Kang Hai
title The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
title_short The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
title_full The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
title_fullStr The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
title_full_unstemmed The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
title_sort effect of implant angle and resist shadowing in submicron implant technology
granting_institution USM
granting_department Pusat Pengajian Sains Perubatan
publishDate 2006
url http://eprints.usm.my/29274/1/The_effect_of_implant_angle.pdf
_version_ 1747820112429187072

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