Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future c...
Saved in:
主要作者: | |
---|---|
格式: | Thesis |
语言: | English |
出版: |
2004
|
主题: | |
在线阅读: | http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf |
标签: |
添加标签
没有标签, 成为第一个标记此记录!
|
id |
my-usm-ep.3087 |
---|---|
record_format |
uketd_dc |
spelling |
my-usm-ep.30872017-03-22T02:23:56Z Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] 2004-03 Lim, Alex Ying Kiat QC501-766 Electricity and magnetism Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication. 2004-03 Thesis http://eprints.usm.my/3087/ http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Sains Fizik |
institution |
Universiti Sains Malaysia |
collection |
USM Institutional Repository |
language |
English |
topic |
QC501-766 Electricity and magnetism |
spellingShingle |
QC501-766 Electricity and magnetism Lim, Alex Ying Kiat Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
description |
Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah.
The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication. |
format |
Thesis |
qualification_level |
Master's degree |
author |
Lim, Alex Ying Kiat |
author_facet |
Lim, Alex Ying Kiat |
author_sort |
Lim, Alex Ying Kiat |
title |
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
title_short |
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
title_full |
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
title_fullStr |
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
title_full_unstemmed |
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
title_sort |
carbon doped silicon dioxide low k dielectric material.[qc585.75.s55 l732 2004 f rb][microfiche 7649] |
granting_institution |
Universiti Sains Malaysia |
granting_department |
Pusat Pengajian Sains Fizik |
publishDate |
2004 |
url |
http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf |
_version_ |
1747819664254173184 |