Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future c...
Saved in:
Main Author: | Lim, Alex Ying Kiat |
---|---|
Format: | Thesis |
Language: | English |
Published: |
2004
|
Subjects: | |
Online Access: | http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
by: Lee,, Kang Hai
Published: (2006) -
Pengkelasan Dan Pencirian Sampel Tanah Menggunakan Gelombang Mikro [QC661. F172 2007 f rb].
by: Aziz, Mohd Fairuz Affandi
Published: (2007) -
Synthesis And Characterization Of Undoped And Mg-Doped Zno Nanorods By Hydrothermal Method For Photodetector And Led Applications
by: Azzez, Shrook Adnan
Published: (2017) -
Polycrystalline Gan Layer On M-Plane Sapphire Substrate For Metal-Semiconductor-Metal Photodetector
by: Kamarulzaman, Azharul Ariff
Published: (2017) -
Electrical-field activated sintering and forming of micro-components
by: Zulkipli, Muhammad
Published: (2017)