Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif s...

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Main Author: Siow, Yuen Tien
Format: Thesis
Language:English
Published: 2008
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Online Access:http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf
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spelling my-usm-ep.312102017-04-17T09:26:35Z Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study 2008-11 Siow, Yuen Tien TJ1 Mechanical engineering and machinery Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif setelah membelanjakan beribu juta dalam perlaburan. Tanpa penggunaan perisian komputer yang canggih dalam analisis, adalah sukar untuk menggunakan teknik purba dalam analisis pengiraan apabila menghadapi perkembangan produk yang semakin tinggi teknologinya. Dalam kajian ini, satu model simulasi telah dibina untuk menganalisis masa mendulu dalam alatan photolithography melalui teknik yang lebih sistematik dan efektif. Model simulasi ini telah dibina berasaskan perisian computer yang memerlukan informasi yang teliti seperti mas a memproses dan juga aliran proses dalam alatan photolithography. The industry of semiconductor wafer fabrication ("fab") has invested a huge amount of capital on the manufacturing equipments particular in photolithography area which has driven the needs to re-look at the most profitable way of utilizing and operating them efficiently. Traditional industrial engineering analysis techniques through mathematical models or static models for the studies of photolithography process are simply not adequate to analyze these complex environments. In this research, a more realistic representation of photolithography tools that can give a better prediction results and a more systematic methodology for minimizing photolithography cycle time is presented. The proposed method is to reduce waiting time and increase utilization of the photolithography process, which would result in an overall equipment cycle time reduction. 2008-11 Thesis http://eprints.usm.my/31210/ http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Kejuruteraan Mekanikal
institution Universiti Sains Malaysia
collection USM Institutional Repository
language English
topic TJ1 Mechanical engineering and machinery
spellingShingle TJ1 Mechanical engineering and machinery
Siow, Yuen Tien
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
description Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif setelah membelanjakan beribu juta dalam perlaburan. Tanpa penggunaan perisian komputer yang canggih dalam analisis, adalah sukar untuk menggunakan teknik purba dalam analisis pengiraan apabila menghadapi perkembangan produk yang semakin tinggi teknologinya. Dalam kajian ini, satu model simulasi telah dibina untuk menganalisis masa mendulu dalam alatan photolithography melalui teknik yang lebih sistematik dan efektif. Model simulasi ini telah dibina berasaskan perisian computer yang memerlukan informasi yang teliti seperti mas a memproses dan juga aliran proses dalam alatan photolithography. The industry of semiconductor wafer fabrication ("fab") has invested a huge amount of capital on the manufacturing equipments particular in photolithography area which has driven the needs to re-look at the most profitable way of utilizing and operating them efficiently. Traditional industrial engineering analysis techniques through mathematical models or static models for the studies of photolithography process are simply not adequate to analyze these complex environments. In this research, a more realistic representation of photolithography tools that can give a better prediction results and a more systematic methodology for minimizing photolithography cycle time is presented. The proposed method is to reduce waiting time and increase utilization of the photolithography process, which would result in an overall equipment cycle time reduction.
format Thesis
qualification_level Master's degree
author Siow, Yuen Tien
author_facet Siow, Yuen Tien
author_sort Siow, Yuen Tien
title Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
title_short Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
title_full Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
title_fullStr Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
title_full_unstemmed Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study
title_sort cycle time analysis for photolithography tools in semiconductor manufacturing industry with simulation model: a case study
granting_institution Universiti Sains Malaysia
granting_department Pusat Pengajian Kejuruteraan Mekanikal
publishDate 2008
url http://eprints.usm.my/31210/1/SIOW_YUEN_TIEN.pdf
_version_ 1747820404118913024