Lok , Y. H. (2009). Particle Removal In Post Chemical-Mechanical Planarization (Cmp) Cleaning Process: Experimental And Modeling Studies.
Chicago Style (17th ed.) CitationLok , Yian Han. Particle Removal In Post Chemical-Mechanical Planarization (Cmp) Cleaning Process: Experimental And Modeling Studies. 2009.
MLA (8th ed.) CitationLok , Yian Han. Particle Removal In Post Chemical-Mechanical Planarization (Cmp) Cleaning Process: Experimental And Modeling Studies. 2009.
Warning: These citations may not always be 100% accurate.