Particle Removal In Post Chemical-Mechanical
Planarization (Cmp) Cleaning Process: Experimental And
Modeling Studies

Particle Removal In Post Chemical-Mechanical Planarization (Cmp) Cleaning Process: Experimental And Modeling Studies

Proses pencucian pasca perataan secara mekanikal-kimia memainkan peranan penting dalam teknologi wafer kerana ia adalah salah satu objektif untuk menghasilkan permukaan yang berkualiti tinggi bagi dimensi yang halus. Kajian ini terdiri daripada eksperimen dan teori untuk menilai kecekapan penying...

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書目詳細資料
主要作者:	Lok , Yian Han
格式:	Thesis
語言:	English
出版:	2009
主題:	TP1-1185 Chemical technology
在線閱讀:	http://eprints.usm.my/41279/1/Lok_Yian_Han24.pdf
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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