Investigation Of Metal Organic Deposition Derived Cerium Oxide Thin Films On Silicon Wafer
Cerium oxide (CeO2) thin films have been formed on silicon (Si) substrates via metal organic decomposition route in order to resolve the usefulness of this oxide as an alternative gate dielectric for Si-based metal-oxide-semiconductor (MOS) applications. Salts of cerium(III) nitrate and ceriu...
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| Main Author: | |
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| Format: | Thesis |
| Language: | English |
| Published: |
2009
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| Subjects: | |
| Online Access: | http://eprints.usm.my/42928/1/Farah_Anis_Binti_Jasni24.pdf |
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| Summary: | Cerium oxide (CeO2) thin films have been formed on silicon (Si) substrates via metal
organic decomposition route in order to resolve the usefulness of this oxide as an
alternative gate dielectric for Si-based metal-oxide-semiconductor (MOS)
applications. Salts of cerium(III) nitrate and cerium(III) acetylacetonate were
independently used as the starting material with the addition of methanol and acetic
acid to form a constant concentration of 0.25 M. Solution was spin coated on a Si
substrate. Conversion to oxide was done by annealing at temperatures ranging from
400oC to 1000oC for 15 minutes in argon. The samples were quenched to room
temperature. Chemical analysis via X-ray diffraction methods and Raman
spectroscopy indicated that CeO2 formed on the substrate after annealing. Structure
and phase composition of the films, after heat treatment, were strongly temperature
dependent. Surface morphologies were characterized by field emission scanning
electron microscope. The morphologies were strongly dependent on the initial
cerium salts being used and temperature of annealing. Films fabricated via
cerium(III) nitrate showed apparent cracking and peeling. |
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