Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications

CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasoni...

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Main Author:	Suhariadi, Iping
Format:	Thesis
Language:	English
Published:	2011
Subjects:	TN1-997 Mining engineering Metallurgy
Online Access:	http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf
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id	my-usm-ep.43322
record_format	uketd_dc
spelling	my-usm-ep.433222019-04-12T05:26:31Z Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications 2011-08 Suhariadi, Iping TN1-997 Mining engineering. Metallurgy CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasonic spray pyrolysis (USP) technique on a cleaned n-type Si substrate. The precursor solution used was comprised of a mixture of Cu(NO3)2.3H2O and Al(NO3)3.9H2O. The deposition parameter influences the film properties are the flow rate of carrier gas, nozzle-substrate distance, substrate‘s temperature and Cu to Al ratio was studied thoroughly. 2011-08 Thesis http://eprints.usm.my/43322/ http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Kejuteraan Bahan & Sumber Mineral
institution	Universiti Sains Malaysia
collection	USM Institutional Repository
language	English
topic	TN1-997 Mining engineering Metallurgy
spellingShingle	TN1-997 Mining engineering Metallurgy Suhariadi, Iping Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
description	CuAlO2 is a p-type oxide which is transparent. When coupled with an n-type material, a p-n junction can be created and can be used in many interesting optical and electronic applications. Smooth, crack free and homogenous CuAlO2 film was produced by chemical solution deposition process via ultrasonic spray pyrolysis (USP) technique on a cleaned n-type Si substrate. The precursor solution used was comprised of a mixture of Cu(NO3)2.3H2O and Al(NO3)3.9H2O. The deposition parameter influences the film properties are the flow rate of carrier gas, nozzle-substrate distance, substrate‘s temperature and Cu to Al ratio was studied thoroughly.
format	Thesis
qualification_level	Master's degree
author	Suhariadi, Iping
author_facet	Suhariadi, Iping
author_sort	Suhariadi, Iping
title	Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_short	Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_full	Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_fullStr	Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_full_unstemmed	Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications
title_sort	formation of cualo2 thin films by ultrasonic spray pyrolysis for photodiode applications
granting_institution	Universiti Sains Malaysia
granting_department	Pusat Pengajian Kejuteraan Bahan & Sumber Mineral
publishDate	2011
url	http://eprints.usm.my/43322/1/IPING%20SUHARIADI.pdf
_version_	1747821196610633728

Formation Of CuAlO2 Thin Films By Ultrasonic Spray Pyrolysis For Photodiode Applications

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