Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment

Thin film Zr on Si and SiC were formed by sputtering. The films then underwent simultaneous oxidation and nitridation in N2O. The effects of oxidation/nitridation durations (5 20 min) and temperatures (500 1100oC) on the sputtered Zr/Si system and the effects of oxidation/nitridation temperatures (...

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主要作者: Wong, Yew Hoong
格式: Thesis
语言:English
出版: 2012
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在线阅读:http://eprints.usm.my/44927/1/WONG%20YEW%20HOONG.pdf
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