Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications

The aim of this study was to grow good crystalline quality of NiO thin films over Si substrate for photodetection application. The study was divided into three main parts. The first part focuses on growth of nanostructured NiO thin films using non-reactive RF sputtering technique. XRD analysis showe...

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Main Author:	Ahmed, Anas Awad Hasan
Format:	Thesis
Language:	English
Published:	2020
Subjects:	QC1 Physics (General)
Online Access:	http://eprints.usm.my/54999/1/ANAS%20AWAD%20HASAN%20AHMED%20-%20TESIS%20cut.pdf
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spelling	my-usm-ep.549992022-09-29T06:41:49Z Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications 2020-07 Ahmed, Anas Awad Hasan QC1 Physics (General) The aim of this study was to grow good crystalline quality of NiO thin films over Si substrate for photodetection application. The study was divided into three main parts. The first part focuses on growth of nanostructured NiO thin films using non-reactive RF sputtering technique. XRD analysis showed that with increasing substrate temperature from RT to 100 oC, the crystallite size was increased from 19.14 to 28.20 nm; followed by a decrease to 14.71 nm as the substrate temperature was increased to 200 oC. The further increase of the temperature to 300 oC, resulted in decomposition of NiO film into Ni. With the increase of the RF power from 150 to 200 W and the film thickness from 350 to 640 nm, the crystallite size was improved from 17.46 to 28.20 nm and from 28.20 to 29.66 nm, respectively; however, the crystalline quality of the films was degraded when the RF power and film thickness were further increased to 300 W and 920 nm, respectively. NiO film deposited at 100 oC, RF power 200 W and thickness 640 nm showed optimal crystalline quality with crystallite size value of 29.66 nm for which it was then selected for photodetection application. The second part of this work studies the growth of nanostructured NiO films using sol-gel spin coating technique. NiO film grown at stabilizer molar ratio of 0:1 suffered from severe cracks. The increase in the molar ratio to 1:1 resulted in cracks-free film. NiO film coated at molar ratio of 1:1 was annealed at different temperatures (300 to 650 oC). 2020-07 Thesis http://eprints.usm.my/54999/ http://eprints.usm.my/54999/1/ANAS%20AWAD%20HASAN%20AHMED%20-%20TESIS%20cut.pdf application/pdf en public phd doctoral Universiti Sains Malaysia Pusat Pengajian Sains Fizik
institution	Universiti Sains Malaysia
collection	USM Institutional Repository
language	English
topic	QC1 Physics (General)
spellingShingle	QC1 Physics (General) Ahmed, Anas Awad Hasan Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
description	The aim of this study was to grow good crystalline quality of NiO thin films over Si substrate for photodetection application. The study was divided into three main parts. The first part focuses on growth of nanostructured NiO thin films using non-reactive RF sputtering technique. XRD analysis showed that with increasing substrate temperature from RT to 100 oC, the crystallite size was increased from 19.14 to 28.20 nm; followed by a decrease to 14.71 nm as the substrate temperature was increased to 200 oC. The further increase of the temperature to 300 oC, resulted in decomposition of NiO film into Ni. With the increase of the RF power from 150 to 200 W and the film thickness from 350 to 640 nm, the crystallite size was improved from 17.46 to 28.20 nm and from 28.20 to 29.66 nm, respectively; however, the crystalline quality of the films was degraded when the RF power and film thickness were further increased to 300 W and 920 nm, respectively. NiO film deposited at 100 oC, RF power 200 W and thickness 640 nm showed optimal crystalline quality with crystallite size value of 29.66 nm for which it was then selected for photodetection application. The second part of this work studies the growth of nanostructured NiO films using sol-gel spin coating technique. NiO film grown at stabilizer molar ratio of 0:1 suffered from severe cracks. The increase in the molar ratio to 1:1 resulted in cracks-free film. NiO film coated at molar ratio of 1:1 was annealed at different temperatures (300 to 650 oC).
format	Thesis
qualification_name	Doctor of Philosophy (PhD.)
qualification_level	Doctorate
author	Ahmed, Anas Awad Hasan
author_facet	Ahmed, Anas Awad Hasan
author_sort	Ahmed, Anas Awad Hasan
title	Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
title_short	Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
title_full	Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
title_fullStr	Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
title_full_unstemmed	Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications
title_sort	growth and characterization of nanostructured nickel oxide thin films for photodetection applications
granting_institution	Universiti Sains Malaysia
granting_department	Pusat Pengajian Sains Fizik
publishDate	2020
url	http://eprints.usm.my/54999/1/ANAS%20AWAD%20HASAN%20AHMED%20-%20TESIS%20cut.pdf
_version_	1747822302969462784

Growth And Characterization Of Nanostructured Nickel Oxide Thin Films For Photodetection Applications

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