Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].

Thesis ini memperkenalkan satu model padat, dua model berasaskan empirikal dan satu model berasaskan fizikal untuk kesan tekanan mekanikal Pengasingan Peparit Cetek (STI) ke atas transistor CMOS di bawah submikron. This thesis introduces a compact model, two empirical-based models and a physi...

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主要作者: Tan, Philip Beow Yew
格式: Thesis
语言:English
出版: 2008
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spelling my-usm-ep.95832017-05-31T05:06:40Z Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb]. 2008-08 Tan, Philip Beow Yew TK7800-8360 Electronics Thesis ini memperkenalkan satu model padat, dua model berasaskan empirikal dan satu model berasaskan fizikal untuk kesan tekanan mekanikal Pengasingan Peparit Cetek (STI) ke atas transistor CMOS di bawah submikron. This thesis introduces a compact model, two empirical-based models and a physical-based model of Shallow Trench Isolation (STI) mechanical stress effect on deep submicron CMOS transistor. 2008-08 Thesis http://eprints.usm.my/9583/ http://eprints.usm.my/9583/1/COMPACT_MODELING_OF_DEEP_SUBMICRON_CMOS_TRANSISTOR.pdf application/pdf en public phd doctoral Universiti Sains Malaysia Pusat Pengajian Kejuruteraan Elektrik dan Elektronik
institution Universiti Sains Malaysia
collection USM Institutional Repository
language English
topic TK7800-8360 Electronics
spellingShingle TK7800-8360 Electronics
Tan, Philip Beow Yew
Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
description Thesis ini memperkenalkan satu model padat, dua model berasaskan empirikal dan satu model berasaskan fizikal untuk kesan tekanan mekanikal Pengasingan Peparit Cetek (STI) ke atas transistor CMOS di bawah submikron. This thesis introduces a compact model, two empirical-based models and a physical-based model of Shallow Trench Isolation (STI) mechanical stress effect on deep submicron CMOS transistor.
format Thesis
qualification_name Doctor of Philosophy (PhD.)
qualification_level Doctorate
author Tan, Philip Beow Yew
author_facet Tan, Philip Beow Yew
author_sort Tan, Philip Beow Yew
title Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
title_short Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
title_full Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
title_fullStr Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
title_full_unstemmed Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].
title_sort compact modeling of deep submicron cmos transistor with shallow trench isolation mechanical stress effect [tk7871.99.m44 t161 2008 f rb].
granting_institution Universiti Sains Malaysia
granting_department Pusat Pengajian Kejuruteraan Elektrik dan Elektronik
publishDate 2008
url http://eprints.usm.my/9583/1/COMPACT_MODELING_OF_DEEP_SUBMICRON_CMOS_TRANSISTOR.pdf
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