APA引文

Lee,, K. H. (2006). The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].

Chicago Style (17th ed.) Citation

Lee,, Kang Hai. The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 F Rb]. 2006.

MLA引文

Lee,, Kang Hai. The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 F Rb]. 2006.

警告：這些引文格式不一定是100％准確.