Lee,, K. H. (2006). The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
Chicago Style (17th ed.) CitationLee,, Kang Hai. The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 F Rb]. 2006.
MLA (8th ed.) CitationLee,, Kang Hai. The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 F Rb]. 2006.
Warning: These citations may not always be 100% accurate.