The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].

Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of...

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Main Author:	Lee,, Kang Hai
Format:	Thesis
Language:	English
Published:	2006
Subjects:	QC501-766 Electricity and magnetism
Online Access:	http://eprints.usm.my/9830/1/THE_EFFECT_OF_IMPLANT_ANGLE_AND_RESIST_SHADOWING_IN_SUBMICRON_IMPLANT_TECHNOLOGY.pdf
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id	my-usm-ep.9830
record_format	uketd_dc
spelling	my-usm-ep.98302017-03-22T02:23:54Z The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. 2006-07 Lee,, Kang Hai QC501-766 Electricity and magnetism Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm. 2006-07 Thesis http://eprints.usm.my/9830/ http://eprints.usm.my/9830/1/THE_EFFECT_OF_IMPLANT_ANGLE_AND_RESIST_SHADOWING_IN_SUBMICRON_IMPLANT_TECHNOLOGY.pdf application/pdf en public masters Universiti Sains Malaysia Pusat Pengajian Sains Fizik
institution	Universiti Sains Malaysia
collection	USM Institutional Repository
language	English
topic	QC501-766 Electricity and magnetism
spellingShingle	QC501-766 Electricity and magnetism Lee,, Kang Hai The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
description	Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.
format	Thesis
qualification_level	Master's degree
author	Lee,, Kang Hai
author_facet	Lee,, Kang Hai
author_sort	Lee,, Kang Hai
title	The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
title_short	The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
title_full	The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
title_fullStr	The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
title_full_unstemmed	The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
title_sort	effect of implant angle and resist shadowing in submicron implant technology [qc702.7.i55 l478 2006 f rb].
granting_institution	Universiti Sains Malaysia
granting_department	Pusat Pengajian Sains Fizik
publishDate	2006
url	http://eprints.usm.my/9830/1/THE_EFFECT_OF_IMPLANT_ANGLE_AND_RESIST_SHADOWING_IN_SUBMICRON_IMPLANT_TECHNOLOGY.pdf
_version_	1747819817939763200

The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].

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