The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of...
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| Format: | Thesis |
| Language: | English |
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2006
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| Online Access: | http://eprints.usm.my/9830/1/THE_EFFECT_OF_IMPLANT_ANGLE_AND_RESIST_SHADOWING_IN_SUBMICRON_IMPLANT_TECHNOLOGY.pdf |
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