Remote global alignment error for cycle time improvement of pad inductor layer
Lithography is the key process which transfers the pattern from mask (reticle) to wafer; and pad inductor layer is the last layer in photo masking. The cycle time for pad inductor layer has increased in Silterra Malaysia Sdn. Bhd., by 32% per month due to Global Alignment (GA) error. Meanwhile, engi...
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Main Author: | Devadas, Saandilian |
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Format: | Thesis |
Language: | English English |
Published: |
2018
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Subjects: | |
Online Access: | http://eprints.utem.edu.my/id/eprint/23781/1/Remote%20Global%20Alignment%20Error%20For%20Cycle%20Time%20Improvement%20Of%20Pad%20Inductor%20Layer.pdf http://eprints.utem.edu.my/id/eprint/23781/2/Remote%20global%20alignment%20error%20for%20cycle%20time%20improvement%20of%20pad%20inductor%20layer.pdf |
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