Characterization of reticle esd threshold voltage measurement for CMOS semiconductor manufacturing
A reticle is a critical apparatus in patterning Integrated Circuit (IC) transfer to a silicon wafer during the lithography process and is considered the heart of a wafer fabrication process. It is very sensitive with accurate patterns designed into a nano-meter level on clear quartz. A typical Compl...
محفوظ في:
| المؤلف الرئيسي: | |
|---|---|
| التنسيق: | أطروحة |
| اللغة: | English English |
| منشور في: |
2022
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://eprints.utem.edu.my/id/eprint/26871/1/Characterization%20of%20reticle%20esd%20threshold%20voltage%20measurement%20for%20CMOS%20semiconductor%20manufacturing.pdf http://eprints.utem.edu.my/id/eprint/26871/2/Characterization%20of%20reticle%20esd%20threshold%20voltage%20measurement%20for%20CMOS%20semiconductor%20manufacturing.pdf |
| الوسوم: |
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الانترنت
http://eprints.utem.edu.my/id/eprint/26871/1/Characterization%20of%20reticle%20esd%20threshold%20voltage%20measurement%20for%20CMOS%20semiconductor%20manufacturing.pdfhttp://eprints.utem.edu.my/id/eprint/26871/2/Characterization%20of%20reticle%20esd%20threshold%20voltage%20measurement%20for%20CMOS%20semiconductor%20manufacturing.pdf