Fabrication of smart glass electrochromic device using rf magnetron sputtering

Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest...

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Main Author:	Abdullah, Siti Ashraf
Format:	Thesis
Language:	English English English
Published:	2014
Subjects:	TA Engineering (General) Civil engineering (General)
Online Access:	http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf
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spelling	my-uthm-ep.17222021-10-04T08:47:45Z Fabrication of smart glass electrochromic device using rf magnetron sputtering 2014-01 Abdullah, Siti Ashraf TA Engineering (General). Civil engineering (General) TA1501-1820 Applied optics. Photonics Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals. 2014-01 Thesis http://eprints.uthm.edu.my/1722/ http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf text en public http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf text en staffonly http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf text en validuser mphil masters Universiti Tun Hussein Onn Malaysia Fakulti Kejuruteraan Elektrik dan Elektronik
institution	Universiti Tun Hussein Onn Malaysia
collection	UTHM Institutional Repository
language	English English English
topic	TA Engineering (General) Civil engineering (General) TA Engineering (General) Civil engineering (General)
spellingShingle	TA Engineering (General) Civil engineering (General) TA Engineering (General) Civil engineering (General) Abdullah, Siti Ashraf Fabrication of smart glass electrochromic device using rf magnetron sputtering
description	Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals.
format	Thesis
qualification_name	Master of Philosophy (M.Phil.)
qualification_level	Master's degree
author	Abdullah, Siti Ashraf
author_facet	Abdullah, Siti Ashraf
author_sort	Abdullah, Siti Ashraf
title	Fabrication of smart glass electrochromic device using rf magnetron sputtering
title_short	Fabrication of smart glass electrochromic device using rf magnetron sputtering
title_full	Fabrication of smart glass electrochromic device using rf magnetron sputtering
title_fullStr	Fabrication of smart glass electrochromic device using rf magnetron sputtering
title_full_unstemmed	Fabrication of smart glass electrochromic device using rf magnetron sputtering
title_sort	fabrication of smart glass electrochromic device using rf magnetron sputtering
granting_institution	Universiti Tun Hussein Onn Malaysia
granting_department	Fakulti Kejuruteraan Elektrik dan Elektronik
publishDate	2014
url	http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf
_version_	1747830855504494592

Fabrication of smart glass electrochromic device using rf magnetron sputtering

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