An investigation of physical processes in nanosphere lithography
Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...
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| 主要作者: | |
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| 格式: | Thesis |
| 語言: | English |
| 出版: |
2006
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| 主題: | |
| 在線閱讀: | http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf |
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| 總結: | Various physical processes have been investigated in order to improve the
Nanosphere Lithography (NSL) technique by modifying the nanosphere structures.
Polysytrene CPS) nanospheres used in NSL can be modified in three schemes:
Electron beam, heat and chemical manipulation techniques. The most successful
scheme to modify nanosphere structures is by the electron beam manipulation
technique. Using electron beam irradiation, both the size and shape of the nanospheres
can be modified in a controlled manner. An ordered array of spheres can be modified
by electron beam irradiation to create a pattern otherwise not available through self�assembly alone. Mechanisms of polymer degradation induced by energetic electrons
are discussed.
Heat and chemical manipulation techniques have created freestanding
transportable nanospheres thin films (FTNFs) that can be further processed with
reactive ion etching (RIE) to create a freestanding transportable lithography mask. A
unique honeycomb structure has been created when PS nanospheres were treated with
organic solvents. The formation of the honeycomb structure depends on the
concentration of the organic solvents and the nanosphere dissolution rate when in
contact with organic solvents. |
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