An investigation of physical processes in nanosphere lithography
Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...
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| 主要作者: | |
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| 格式: | Thesis |
| 語言: | English |
| 出版: |
2006
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| 主題: | |
| 在線閱讀: | http://eprints.uthm.edu.my/7348/1/24p%20MOHD%20ARIF%20AGAM.pdf |
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