Variable oxide thickness optimization and reliability analysis of Gate-All-Around floating gate for flash memory cell
Gate-All-Around (GAA) transistor is one of the excellent devices that has been utilized for flash memory applications owing to its gate coupling which led to a higher gate electrostatic control, cheaper manufacturing cost and bigger data storage. However, GAA structure with floating gate memory cell...
محفوظ في:
المؤلف الرئيسي: | A. Hamid, Farah |
---|---|
التنسيق: | أطروحة |
اللغة: | English |
منشور في: |
2020
|
الموضوعات: | |
الوصول للمادة أونلاين: | http://eprints.utm.my/id/eprint/102451/1/FarahAHamidMSKE2020.pdf |
الوسوم: |
إضافة وسم
لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!
|
مواد مشابهة
-
Charge-based compact model of gate-all-around floating gate nanowire with variable oxide thickness for flash memory cell
بواسطة: Hamzah, Muhammad Afiq Nurudin
منشور في: (2018) -
Graphene floating gate flash memory performance with high-k tunnel barrier engineering
بواسطة: Ahmad, Muhammad Hilman
منشور في: (2020) -
Fabrication and chracterization of single and multilayer tunnel dielectrics for advanced floating gate flash memory
بواسطة: Ramzan, Mat Ayub -
Modeling and analysis of cylindrical gate-all around silicon nanowire FET including BOHM quantum potential model
بواسطة: Abd. Razak, Muhammad A’tif
منشور في: (2018) -
Explicit charge-based model for strained-silicon gate-all-around mosfet including quantum and short channel effects
بواسطة: Abd. Hamid, Fatimah Khairiah
منشور في: (2020)