Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating

Cemented tungsten carbide is the most widely used material for cutting tools. Due to extreme demands higher tool life several types of coating have been introduced to prolong the service time which include diamond coating. However cobalt binder in tungsten carbide prevents diamond to adhere well on...

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Main Author: Safari, Habiballah
Format: Thesis
Language:English
Published: 2010
Subjects:
Online Access:http://eprints.utm.my/id/eprint/12537/4/HabiballahSafariMFKM2010.pdf
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spelling my-utm-ep.125372017-09-19T06:21:02Z Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating 2010-12 Safari, Habiballah TJ Mechanical engineering and machinery TS Manufactures Cemented tungsten carbide is the most widely used material for cutting tools. Due to extreme demands higher tool life several types of coating have been introduced to prolong the service time which include diamond coating. However cobalt binder in tungsten carbide prevents diamond to adhere well on the substrate and its content at the outer surface should be reduce to below 1%. Single step and two-step pretreatments have been studied by many researchers. But to date poor adhesion of diamond coating still an issue. In this work a two-step pretreatment was used to etch tungsten carbide with 6% cobalt (WC-6% Co) at the surface of the substrate in order to solve poor adhesion problem. First step with Murakami's reagent (2, 3, 6, and 20 minutes) and the second step of the process were carried out by etching in a solution of hydrochloric acid (30, 45, and 60 seconds) or a solution of sulfuric acid (10 seconds). The effect of them on Co cemented tungsten carbide samples in term of surface morphology, surface roughness, and cobalt removal from the surface were examined. It is found the longer Murakami etching time produces a slightly rougher surface than the shorter exposing time. Both acid solutions were used in the second pretreatment step able to reduce cobalt content to below 1% at all conditions regardless of etching time. The best combination of pretreatment process is 20 minutes Murakami etching and 45 seconds exposure time of hydrochloric acid that yields the higher surface roughness and the lowest cobalt content on the substrate surface. 2010-12 Thesis http://eprints.utm.my/id/eprint/12537/ http://eprints.utm.my/id/eprint/12537/4/HabiballahSafariMFKM2010.pdf application/pdf en public masters Universiti Teknologi Malaysia, Faculty of Mechanical Engineering Faculty of Mechanical Engineering
institution Universiti Teknologi Malaysia
collection UTM Institutional Repository
language English
topic TJ Mechanical engineering and machinery
TS Manufactures
spellingShingle TJ Mechanical engineering and machinery
TS Manufactures
Safari, Habiballah
Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
description Cemented tungsten carbide is the most widely used material for cutting tools. Due to extreme demands higher tool life several types of coating have been introduced to prolong the service time which include diamond coating. However cobalt binder in tungsten carbide prevents diamond to adhere well on the substrate and its content at the outer surface should be reduce to below 1%. Single step and two-step pretreatments have been studied by many researchers. But to date poor adhesion of diamond coating still an issue. In this work a two-step pretreatment was used to etch tungsten carbide with 6% cobalt (WC-6% Co) at the surface of the substrate in order to solve poor adhesion problem. First step with Murakami's reagent (2, 3, 6, and 20 minutes) and the second step of the process were carried out by etching in a solution of hydrochloric acid (30, 45, and 60 seconds) or a solution of sulfuric acid (10 seconds). The effect of them on Co cemented tungsten carbide samples in term of surface morphology, surface roughness, and cobalt removal from the surface were examined. It is found the longer Murakami etching time produces a slightly rougher surface than the shorter exposing time. Both acid solutions were used in the second pretreatment step able to reduce cobalt content to below 1% at all conditions regardless of etching time. The best combination of pretreatment process is 20 minutes Murakami etching and 45 seconds exposure time of hydrochloric acid that yields the higher surface roughness and the lowest cobalt content on the substrate surface.
format Thesis
qualification_level Master's degree
author Safari, Habiballah
author_facet Safari, Habiballah
author_sort Safari, Habiballah
title Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
title_short Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
title_full Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
title_fullStr Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
title_full_unstemmed Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
title_sort effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
granting_institution Universiti Teknologi Malaysia, Faculty of Mechanical Engineering
granting_department Faculty of Mechanical Engineering
publishDate 2010
url http://eprints.utm.my/id/eprint/12537/4/HabiballahSafariMFKM2010.pdf
_version_ 1747814939143176192