Optical properties measurements of nanocrystalline silicon thin films
Nanocrystalline silicon (nc-Si) thin films on 7059 corning glass substrate were prepared using Very High Frequency Plasma-Enhanced Chemical Vapour Deposition (VHF-PECVD) at different deposition temperatures. The nc-Si properties film were analyzed using spectroscopic ellipsometer, ultra violet (UV-V...
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| 格式: | Thesis |
| 语言: | English |
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2011
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| 在线阅读: | http://eprints.utm.my/id/eprint/33381/1/GanCheeHongMFS2011.pdf |
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