The structural and optical properties of hydrogenated amorphous carbon (a-C:H) thin films deposited using a direct current-plasma enhanced chemical vapour deposition (DC-PECVD) technique
Hydrogenated amorphous carbon (a-C:H) thin films were deposited using the DC plasma enhanced chemical vapour deposition (DC-PECVD) technique. The effects of the deposition parameters (chamber pressure, electrode distance, CH4 flow rate, and substrate temperature) on the deposition rate were studied....
محفوظ في:
المؤلف الرئيسي: | Abu Bakar, Suriani |
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التنسيق: | أطروحة |
اللغة: | English |
منشور في: |
2005
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الموضوعات: | |
الوصول للمادة أونلاين: | http://eprints.utm.my/id/eprint/35018/1/SurianiAbuBakar%20MFS2005.pdf |
الوسوم: |
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