The structural and optical properties of hydrogenated amorphous carbon (a-C:H) thin films deposited using a direct current-plasma enhanced chemical vapour deposition (DC-PECVD) technique
Hydrogenated amorphous carbon (a-C:H) thin films were deposited using the DC plasma enhanced chemical vapour deposition (DC-PECVD) technique. The effects of the deposition parameters (chamber pressure, electrode distance, CH4 flow rate, and substrate temperature) on the deposition rate were studied....
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| 格式: | Thesis |
| 语言: | English |
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2005
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| 在线阅读: | http://eprints.utm.my/id/eprint/35018/1/SurianiAbuBakar%20MFS2005.pdf |
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