Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering

The purpose of this research is to study the surface morphology and optical properties of copper nitride thin films. Copper nitride thin films were deposited on corning glass substrates by using DC sputtering technique. Five samples were prepared with five different deposition time to obtain samples...

Full description

Saved in:

Bibliographic Details
Main Author:	Ma’Ajih, Nurul Shahida
Format:	Thesis
Language:	English
Published:	2014
Subjects:	Q Science (General)
Online Access:	http://eprints.utm.my/id/eprint/47971/25/NurulShahidaMa%27ajihMFS2014.pdf
Tags:	Add Tag No Tags, Be the first to tag this record!

id	my-utm-ep.47971
record_format	uketd_dc
spelling	my-utm-ep.479712017-08-06T04:45:53Z Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering 2014-06 Ma’Ajih, Nurul Shahida Q Science (General) The purpose of this research is to study the surface morphology and optical properties of copper nitride thin films. Copper nitride thin films were deposited on corning glass substrates by using DC sputtering technique. Five samples were prepared with five different deposition time to obtain samples of different thicknesses. Ellipsometer was used to measure thickness and refractive index. The surface morphology images were obtained by using Atomic Force Microscopy (AFM). Both transmission spectra and photoluminescence spectrum were obtained from UV-Vis-NIR spectrophotometer and Photoluminescence spectrometer, respectively. The films obtained were yellow to reddish-brown depending on increasing deposition time. The thickness of the samples increased as the deposition time increased. Thicknesses of films, d obtained were in range of 1092.38 nm to 1331.03 nm. Refractive index decreased as deposition times increased. The Atomic Force Microscopy images showed that the films were a smooth morphology and were seen like pyramidal islands when deposition time increased. Transparency of copper nitride thin film was very low in the visible region, but it slowly increased in the infrared range. The absorption coefficient, a of copper nitride thin films increased with increasing of photon energy. The average optical band gap energy, Eg obtained in range of 1.56 eV to 2.06 eV. The best emission peak for maximum intensity was about 380 nm obtained in photoluminescence emission for all samples, which refer to ultra-violet light in visible light region of electromagnetic spectrum. 2014-06 Thesis http://eprints.utm.my/id/eprint/47971/ http://eprints.utm.my/id/eprint/47971/25/NurulShahidaMa%27ajihMFS2014.pdf application/pdf en public masters Universiti Teknologi Malaysia, Faculty of Science Faculty of Science
institution	Universiti Teknologi Malaysia
collection	UTM Institutional Repository
language	English
topic	Q Science (General)
spellingShingle	Q Science (General) Ma’Ajih, Nurul Shahida Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
description	The purpose of this research is to study the surface morphology and optical properties of copper nitride thin films. Copper nitride thin films were deposited on corning glass substrates by using DC sputtering technique. Five samples were prepared with five different deposition time to obtain samples of different thicknesses. Ellipsometer was used to measure thickness and refractive index. The surface morphology images were obtained by using Atomic Force Microscopy (AFM). Both transmission spectra and photoluminescence spectrum were obtained from UV-Vis-NIR spectrophotometer and Photoluminescence spectrometer, respectively. The films obtained were yellow to reddish-brown depending on increasing deposition time. The thickness of the samples increased as the deposition time increased. Thicknesses of films, d obtained were in range of 1092.38 nm to 1331.03 nm. Refractive index decreased as deposition times increased. The Atomic Force Microscopy images showed that the films were a smooth morphology and were seen like pyramidal islands when deposition time increased. Transparency of copper nitride thin film was very low in the visible region, but it slowly increased in the infrared range. The absorption coefficient, a of copper nitride thin films increased with increasing of photon energy. The average optical band gap energy, Eg obtained in range of 1.56 eV to 2.06 eV. The best emission peak for maximum intensity was about 380 nm obtained in photoluminescence emission for all samples, which refer to ultra-violet light in visible light region of electromagnetic spectrum.
format	Thesis
qualification_level	Master's degree
author	Ma’Ajih, Nurul Shahida
author_facet	Ma’Ajih, Nurul Shahida
author_sort	Ma’Ajih, Nurul Shahida
title	Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
title_short	Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
title_full	Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
title_fullStr	Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
title_full_unstemmed	Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
title_sort	surface morphology and optical properties of copper nitride thin film synthesized by dc sputtering
granting_institution	Universiti Teknologi Malaysia, Faculty of Science
granting_department	Faculty of Science
publishDate	2014
url	http://eprints.utm.my/id/eprint/47971/25/NurulShahidaMa%27ajihMFS2014.pdf
_version_	1747817276279619584

Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering

Similar Items