Omar, M. F. (2016). Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition.
Chicago Style (17th ed.) CitationOmar, Muhammad Firdaus. Development of Very High Frequency Plasma Enhanced Chemical Vapour Deposition for Nanostructure Silicon Carbide Thin Film Deposition. 2016.
MLA引文Omar, Muhammad Firdaus. Development of Very High Frequency Plasma Enhanced Chemical Vapour Deposition for Nanostructure Silicon Carbide Thin Film Deposition. 2016.
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