Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition

Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition

Silicon carbide (SiC) is a semiconductor material which has received a great deal of attention due to its outstanding mechanical properties, chemical inertness, thermal stability, superior oxidation resistance, high hardness, wide band gap and relatively low weight for applications in high frequency...

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书目详细资料
主要作者:	Omar, Muhammad Firdaus
格式:	Thesis
语言:	English
出版:	2016
主题:	QC Physics
在线阅读:	http://eprints.utm.my/id/eprint/78785/1/MuhammadFirdausOmarPFS2016.pdf
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