Structure, morphology and wettability properties of carbon nitride nanostructures deposited by plasma enhanced chemical vapour deposition technique /
Saved in:
Main Author: | Shafarina Azlinda Ahmad Kamal (Author) |
---|---|
Format: | Thesis Book |
Language: | English |
Published: |
2016.
|
Subjects: | |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures /
by: Maisara Othman
Published: (2012) -
Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /
by: Mitani, Sufian Mousa Ibrahim
Published: (2004) -
Hydrogenated amorphous silicon by pulsed plasma enhanced chemical vapour deposition technique /
by: Goh, Boon Tong
Published: (2005) -
Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /
by: Aniszawati Azis
Published: (2012) -
Hot-filament plasma enhanced chemical vapour deposition of transfer-free graphene using nickel catalyst /
by: Maisara Othman
Published: (2019)