Formation of ZrO2 gate dielectric on Ge substrate by thermal oxidation and post annealing for metal-oxide-semiconductor devices /
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Main Author: | |
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Format: | Thesis Book |
Language: | English |
Published: |
2019.
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Subjects: | |
Online Access: | http://studentsrepo.um.edu.my/11120/ |
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Physical Description: | xxiv, 181 leaves : illustrations ; 30 cm Also issued in CD. |
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Bibliography: | Bibliography: leaves 160-180. |