Olabisi, O. K. (2022). Development of holmium oxide thin film as high-k gate dielectric based on silicon carbide substrate.
Chicago Style (17th ed.) CitationOlabisi, Odesanya Kazeem. Development of Holmium Oxide Thin Film as High-k Gate Dielectric Based on Silicon Carbide Substrate. 2022.
MLA (8th ed.) CitationOlabisi, Odesanya Kazeem. Development of Holmium Oxide Thin Film as High-k Gate Dielectric Based on Silicon Carbide Substrate. 2022.
Warning: These citations may not always be 100% accurate.