Development of holmium oxide thin film as high-k gate dielectric based on silicon carbide substrate /

Development of holmium oxide thin film as high-k gate dielectric based on silicon carbide substrate /

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主要作者:	Olabisi, Odesanya Kazeem (Author)
格式:	Thesis 图书
语言:	English
出版:	2022.
标签:	添加标签没有标签, 成为第一个标记此记录!

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