Koh, D. K. A. (1995). The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines.
Chicago Style (17th ed.) CitationKoh, David Khar Ann. The Influence of a Layer of Oxide on Electromigration Performance of Al/Cu/Si Metal Lines. 1995.
MLA引文Koh, David Khar Ann. The Influence of a Layer of Oxide on Electromigration Performance of Al/Cu/Si Metal Lines. 1995.
警告:這些引文格式不一定是100%准確.